EN 
EN
DA
NL
FI
FR
DE
IT
JA
KO
NO
PL
PT
RO
RU
ES
SV
TL
ID
SK
UK
VI
TH
TR
FA
BE
LA
UZ
Pusvadītāju kvarca vanna
Ātrā informācija:
1.Other names: Semiconductor quartz tank,quartz bath for semiconductor,quartz tank for semiconductor.
2.Application: The Semiconductor Quartz Bath is a high-purity, corrosion-resistant component specifically engineered for precision cleaning and chemical processing in semiconductor manufacturing. Designed for compatibility with the WS-620C/ WS-820C/ WS-820L system, this quartz bath operates under high-temperature conditions (up to 175°C) and is optimized for use with phosphoric acid (H₃PO₄) solutions, ensuring exceptional performance in critical wafer-cleaning processes.
3. Galvenie parametri:
Fused quartz (>99.99% SiO₂).
Exceptional chemical inertness to H₃PO₄ (phosphoric acid) at elevated temperatures, preventing degradation or particle generation.
Withstands continuous operation at 160°C and peak temperatures of 175°C, maintaining structural integrity and dimensional stability.
Apraksts
The Semiconductor Quartz Bath is a high-purity, corrosion-resistant component specifically engineered for precision cleaning and chemical processing in semiconductor manufacturing. Designed for compatibility with the WS-620C/ WS-820C/ WS-820L system, this quartz bath operates under high-temperature conditions (up to 175°C) and is optimized for use with phosphoric acid (H₃PO₄) solutions, ensuring exceptional performance in critical wafer-cleaning processes.
Galvenās iezīmes
Materiālā pārākums
High-Purity Quartz: Manufactured from synthetic fused quartz (>99.99% SiO₂), ensuring minimal contamination and resistance to thermal shock.
Skābju izturība
Exceptional chemical inertness to H₃PO₄ (phosphoric acid) at elevated temperatures, preventing degradation or particle generation.
Termiskā stabilitāte
Withstands continuous operation at 160°C and peak temperatures of 180°C, maintaining structural integrity and dimensional stability.
Veiktspējas priekšrocības
Contamination Control: Ultra-smooth surface finish minimizes particle adhesion, critical for sub-micron semiconductor node processes.
Longevity: Quartz’s resistance to acid corrosion and thermal fatigue extends service life, reducing downtime and maintenance costs.
Process Consistency: Stable thermal conductivity ensures uniform temperature distribution, enhancing cleaning efficiency and repeatability.
Why Choose Semixlab’s Semiconductor Quartz Bath?
Semiconductor-Grade Quality: Produced in a cleanroom environment to meet SEMI standards.
Tailored Solutions: Custom designs available to match specific process requirements.
Reliability: Rigorous quality testing ensures compliance with semiconductor industry demands.
specifikācija
| Mehāniskais īpašums | Blīvums (g/cm³3) | 2.2 |
| Mosa cietība | 6-7 | |
| Spiedes izturība (MPa) | 1100 | |
| Stiepes izturība (N/mm2) | 50 | |
| Lieces izturība (N/mm2) | 65 | |
| Vērpes izturība (N/mm2) | 30 | |
| Janga modulis (MPa) | 7.2x104 | |
| Puasona attiecība | 0.16 | |
| Termiskās īpašības | Coefficient of thermal expansion (20~320℃,k-1) | 5.5x10-7 |
| Siltumvadītspēja (20 ℃, W·m-1k-1) | 1.4 | |
| Specific heat (20℃, J·kg-1k-1) | 670 | |
| Mīkstināšanas temperatūra (℃) | 1700 | |
| Atkvēlināšanas punkts (℃) | 1180 | |
| Spriegojuma punkts (℃) | 1080 | |
| Elektriskais īpašums | Electrical resistivity (Ω·m) | 1x1016(20 ℃) |
| Dielektriskā konstante (10 GHz) | 3.74 | |
| Dielektriskie zudumi (10 GHz) | 0.0002 | |
| Dielectric strength (V·m-1) | 3.7x107 |
Aplikācijas
Wafer Cleaning: Removal of photoresist, residues, and contaminants in H₃PO₄-based solutions post-etching or lithography.
High-Temperature Processes: Suitable for advanced semiconductor fabrication steps requiring aggressive chemistries at elevated temperatures.
Compatibility: Ideal for WS-620C/ WS-820C/ WS-820L system in fabs producing logic, memory, or power devices.
